System and method for determining line widths of...

Details System and method for determining line widths of... System and method for determining line widths of...

2006-09-05

2006-09-05

Dang, Phuc T. (Department: 2818)

Semiconductor device manufacturing: process

Radiation or energy treatment modifying properties of...

C438S014000, C438S799000

Reexamination Certificate

active

07101817

ABSTRACT:
A apparatus and method for determining minimum line widths of free standing structures built by a semiconductor (S/C) manufacturing process. Free standing structures are created in a semiconductor device and subjected to an aerosol process which is tuned and centered with respect to a critical line width for the free standing structures. The S/C manufacturing process is tuned responsive to failure of free standing structures of sub-critical line widths.

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James F. Weygand, et al.Cleaning silicon wafers with an argon
itrogen cryogenic aerosol process.14 pages. Accessed Jun. 17, 2004 at http://www.micromagazine.com/archive/97/04/wegland.html.
FSI International, Inc.Glossary.Accessed Jun. 17, 2004 at http://www.fsik-intl.com/products/glossary.php.

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