System and method for cleaning an ion implanter

Cleaning and liquid contact with solids – Processes – Including use of vacuum – suction – or inert atmosphere

Reexamination Certificate

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Details

C134S008000, C134S022100, C134S026000, C134S037000, C015S320000, C015S322000

Reexamination Certificate

active

07544254

ABSTRACT:
This disclosure provides an approach for cleaning an ion implanter. In this disclosure, there is a vacuum device having an in-take port adapted to receive a contaminant removing hose. The vacuum device and hose are configured to provide constant suction to the ion implanter. A dry ice blaster having a dry ice dispensing hose is configured to supply dry ice. A sealing plate is adapted to attach to an access section of a processing region of the ion implanter. The sealing plate has a first opening configured to receive the contaminant removing hose and the dry ice dispensing hose.

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patent: 6790289 (2004-09-01), Takase et al.
patent: 6909102 (2005-06-01), Buccos
patent: 2003/0172952 (2003-09-01), Takase et al.
patent: 2004/0011378 (2004-01-01), Jackson
patent: 2004/0216769 (2004-11-01), Takase et al.
patent: 2006/0099444 (2006-05-01), Moriya et al.
patent: 2006/0124155 (2006-06-01), Suuronen et al.
patent: 2007/0215174 (2007-09-01), Kruger et al.
patent: 2008/0142047 (2008-06-01), Buccos

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