Brushing – scrubbing – and general cleaning – Machines – Brushing
Reexamination Certificate
2006-03-07
2006-03-07
Spisich, Mark (Department: 1744)
Brushing, scrubbing, and general cleaning
Machines
Brushing
C015S088300
Reexamination Certificate
active
07007333
ABSTRACT:
A system and a method for cleaning and rinsing a wafer includes at least three rollers that are capable of supporting a wafer by an edge of the wafer. At least one of the rollers is driven and thereby capable of rotating the wafer. At least one of the rollers is a movable roller mounted on an actuator. The system and method also includes a first movable scrubbing roller capable of being moved away from and alternatively to the first side of the wafer. A second movable scrubbing roller capable of being moved away from and alternatively to a second side of the wafer is also included. The second side of the wafer opposes the first side of the wafer. The system and method also includes at least one first side nozzle directed toward the first side of the wafer and at least one second side nozzle directed toward the second side of the wafer.
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deLarios John
Mikhaylichenko Katrina
Ravkin Michael
Lam Research Corporation
Martine Penilla and Gencarella LLP
Spisich Mark
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