Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2005-05-31
2005-05-31
Dang, Phuc T. (Department: 2818)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S214000, C438S254000
Reexamination Certificate
active
06900087
ABSTRACT:
The present invention relates to integrated circuits having symmetric inducting devices with a ground shield. In one embodiment, a symmetric inducting device for an integrated circuit comprises a substrate, a main metal layer and a shield. The substrate has a working surface. The main metal layer has at least one pair of current path regions. Each of the current path region pairs is formed in generally a regular polygonal shape that is generally symmetric about a plane of symmetry that is perpendicular to the working surface of the substrate. The shield is patterned into segments that are generally symmetric about the plane of symmetry. Medial portions of at least some segments of the shield are formed generally perpendicular to the plane of symmetry as the medial portions cross the plane of symmetry.
REFERENCES:
patent: 5446311 (1995-08-01), Ewen et al.
patent: 5717243 (1998-02-01), Lowther
patent: 5892425 (1999-04-01), Kuhn et al.
patent: 9278186 (2001-08-01), Lowther et al.
Lowther Rex Everett
Young William R.
Dang Phuc T.
Globespan Virata Incorporated
Hunton & Williams LLP
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