Susceptor system

Details Susceptor system Susceptor system

2002-12-10

2009-02-10

Robinson, Daniel L (Department: 3742)

Electric heating

Inductive heating

With heat exchange

C118S724000

Reexamination Certificate

active

07488922

ABSTRACT:
The present invention relates to a susceptor system for an apparatus for the treatment of substrates and/or wafers, provided with a treatment chamber (1) delimited by at least two walls and with at least one heating solenoid (9); the susceptor system comprises at least one susceptor element (2, 3) delimited by an outer surface and made of electrically conducting material suitable for being heated by electromagnetic induction; the susceptor element (2, 3) is hollow; a first portion of the outer surface of the susceptor element (2, 3) is suitable for acting as a wall of the treatment chamber (1); a second portion of the outer surface of the susceptor element (2, 3) is suitable for being disposed close to the heating solenoid (9).

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Zhang, J., et al., “Growth Characteristics of SiC in a Hot-Wall CVD Reactor with Rotation”, Journal of Crystal Growth 241 (2002) pp. 431-438.

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