Surface treatment of silicone-based coating films

Details Surface treatment of silicone-based coating films Surface treatment of silicone-based coating films

1987-09-03

1989-09-19

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Removal of imaged layers

430386, 427 38, 427 40, G03C 500

Patent

active

048680966

ABSTRACT:
The adhesiveness of a silicone-based coating film on a substrate to an overcoating layer, e.g., a photoresist layer, can be improved without causing cracks when the silicone-based coating film is subjected to a plasma treatment at a temperature of 120.degree. C. or below in an atmosphere of a gas mainly composed of oxygen. Similar conditions of plasma treatment are applicable when patterning of a silicone-based coating film is desired in a procedure comprising the steps of forming a photoresist layer thereon, patterning of the photoresist layer in a photolithographic method, selectively etching the silicone-based coating film with the patterned resist layer serving as a mask and removing the photoresist layer by the plasma treatment.

REFERENCES:
patent: 4292384 (1981-09-01), Straughan et al.
patent: 4368092 (1983-01-01), Steinberg et al.
patent: 4430153 (1984-02-01), Gleason et al.
patent: 4723978 (1988-02-01), Clodgo et al.
Butherus et al, "O.sub.2 Plasma-Converted SOG for Planarization," J. Vac. Sci. Technol. B3(5), Sep./Oct. 1985, pp. 1352-1356.

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