Surface processing apparatus utilizing local thermal equilibrium

Details Surface processing apparatus utilizing local thermal equilibrium Surface processing apparatus utilizing local thermal equilibrium

1986-03-28

1987-05-12

Lindsay, Robert

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

118 501, 118620, 156243, 156345, 204298, 20419232, B44C 122

Patent

active

046647473

ABSTRACT:
In a surface processing apparatus, the LTE (Local Thermal Equilibrium) plasma is produced, instead of the glow discharge, in the discharge chamber. Then the LTE plasma is conducted into the reaction chamber. The surface of the substrate positioned in the reaction chamber is exposed to at least one of the radiation and the active species generated from the LTE plasma for performing the surface processing.

REFERENCES:
patent: 4316791 (1982-02-01), Taillet
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patent: 4462863 (1984-07-01), Nishimatsu et al.
patent: 4512868 (1985-04-01), Fujimura et al.
patent: 4532971 (1985-06-01), Cuomo et al.
patent: 4569719 (1986-02-01), Coleman
patent: 4579623 (1986-04-01), Suzuki et al.
patent: 4581100 (1986-04-01), Hatzakis et al.
patent: 4600464 (1986-07-01), Desilets et al.
patent: 4609428 (1986-09-01), Fujimura

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