4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Hideo Mito

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Apparatus for processing an object by gas plasma with a reduced

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Method of improving or producing oxide superconductor

Superconductor technology: apparatus – material – process – Processes of producing or treating high temperature... – Utilizing electromagnetic wave energy – ion – or plasma
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Surface processing apparatus utilizing local thermal equilibrium

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
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Profile ID: LFUS-PAI-P-81438

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