Surface cleaning using sacrificial getter layer

Details Surface cleaning using sacrificial getter layer Surface cleaning using sacrificial getter layer

2011-08-09

2011-08-09

Fourson, George (Department: 2823)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Gettering of semiconductor substrate

C438S402000, C438S476000, C438S655000, C438S664000, C438S683000, C257SE21318, C257SE21593

Reexamination Certificate

active

07993987

ABSTRACT:
A method includes providing a substrate including a non-insulative, silicon-including region for silicidation, the substrate including one or more contaminants at a top surface thereof. A getter layer is deposited over the non-insulative, silicon-including region, the getter layer reacting with at least one of the one or more contaminants in the non-insulative, silicon-including region at approximately room temperature. The getter layer is removed, and siliciding of the non-insulative, silicon-including region is performed.

REFERENCES:
patent: 4561171 (1985-12-01), Schlosser
patent: 5940735 (1999-08-01), Mehta et al.
patent: 5989984 (1999-11-01), Anderson et al.
patent: 6060766 (2000-05-01), Mehta et al.
patent: 6090645 (2000-07-01), Hamada
patent: 6166428 (2000-12-01), Mehta et al.
patent: 6228748 (2001-05-01), Anderson et al.
patent: 6524911 (2003-02-01), Mehta
patent: 2002/0151170 (2002-10-01), Maex et al.
patent: 2003/0027420 (2003-02-01), Lai et al.
patent: 2009/0152651 (2009-06-01), Bu et al.
patent: 2010/0048010 (2010-02-01), Chen et al.

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