Supplying RF power to a plasma process

Details Supplying RF power to a plasma process Supplying RF power to a plasma process

2011-07-19

2011-07-19

Ahmed, Shamim (Department: 1713)

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

C216S058000, C216S059000, C438S706000, C438S710000, C219S121540, C315S111210

Reexamination Certificate

active

07981306

ABSTRACT:
Generating drive signals of at least two RF power generators which supply RF power to a plasma process, in which at least two drive signals, each driving one RF power generator, are generated in an RF generator driver. Each drive signal is generated by a respective function generator, such as a digital sine generator, of the generator driver.

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