Super self-aligned collector device for mono-and hetero...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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C438S313000, C438S340000

Reexamination Certificate

active

07015085

ABSTRACT:
The invention relates to a process of forming a compact bipolar junction transistor (BJT) that includes forming a self-aligned collector tap adjacent the emitter stack and an isolation structure. A base layer is formed from epitaxial silicon that is disposed in the substrate.

REFERENCES:
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patent: 6476452 (2002-11-01), Suzuki
patent: 6703685 (2004-03-01), Ahmed et al.
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patent: 0 779 663 (1997-06-01), None
patent: 61085864 (1986-01-01), None
W. Liu, et al., “Novel Doubly Self-Aligned AIGaAs/GaAs HBT,” Abstract, Electronic Letters, IEE Stevenage, GB, vol. 26, No. 17 Aug. 16, 1990 2 pages.
PCT Search Report dated Sep. 12, 2003, 7 pages.

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