Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2007-01-23
2007-01-23
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S270100, C430S326000, C430S906000
Reexamination Certificate
active
10932316
ABSTRACT:
A base polymer of a resist material includes a unit represented by a general formula of the following Chemical Formula 3:wherein R1, R2and R3are the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; and R5and R6are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group, a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid.
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Endo Masayuki
Fukuhara Toshiaki
Imori Hirokazu
Kishimura Shinji
Sasago Masaru
Chu John S.
McDermott Will & Emery LLP
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