Substrate treatment method and substrate treatment apparatus

Details Substrate treatment method and substrate treatment apparatus Substrate treatment method and substrate treatment apparatus

2007-07-10

2007-07-10

MacArthur, Sylvia (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With workpiece support

C118S730000, C134S149000, C134S902000

Reexamination Certificate

active

11120242

ABSTRACT:
A substrate treatment method for treating a substrate by supplying a treatment liquid to the substrate while rotating the substrate. The method comprises the steps of: performing a first substrate rotation process for rotating the substrate while clamping the substrate by a first clamping member set; performing a second substrate rotation process after the first substrate rotation step for rotating the substrate while clamping the substrate by the first clamping member set and a second clamping member set provided separately from the first clamping member set; and performing a third substrate rotation process after the second substrate rotation step by unclamping the substrate from the first clamping member set for rotating the substrate while clamping the substrate by the second clamping member set.

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patent: 2003088793 (2003-03-01), None

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