Cleaning and liquid contact with solids – Apparatus – With treating fluid purifying or separating means
Reexamination Certificate
2005-02-08
2005-02-08
Kornakov, M. (Department: 1746)
Cleaning and liquid contact with solids
Apparatus
With treating fluid purifying or separating means
C134S184000, C134S186000, C134S902000, C015S021100, C015S088200, C015S088300
Reexamination Certificate
active
06851436
ABSTRACT:
A system and method for re-circulating processing fluids in a substrate processing system is provided. A fluid re-circulation system for a brush box processing tool includes a supply tank into which processing chemicals, DI water, or other processing fluids are introduced into the system from an external source. Processing chemicals are provided to the brush box and dispensed to process a substrate. Dispensed fluids drain from the brush box into a diverter through which fluids either flow to waste, or into a collection tank. Fluids from the collection tank flow into the supply tank to re-circulate for wafer processing. The re-circulation system includes filters for maintaining chemical purity, and chemical concentration is monitored and adjusted as necessary.
REFERENCES:
patent: 4194263 (1980-03-01), Herpers et al.
patent: 4295244 (1981-10-01), Herpers et al.
patent: 4377017 (1983-03-01), Herpers et al.
patent: 4859158 (1989-08-01), Weinbrecht
patent: 5263504 (1993-11-01), Bailey et al.
patent: 5564159 (1996-10-01), Treiber
patent: 5890251 (1999-04-01), Terui
patent: 6273100 (2001-08-01), Andreas et al.
patent: 6378534 (2002-04-01), Olesen et al.
patent: 10-321577 (1998-12-01), None
deLarios John
Garcia James P.
Mikhaylichenko Katrina
Nickhou Afshin
Ravkin Michael
Kornakov M.
Lam Research Corporation
Martine & Penilla LLP
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