Substrate processing using a fluid re-circulation system in...

Cleaning and liquid contact with solids – Apparatus – With treating fluid purifying or separating means

Reexamination Certificate

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C134S184000, C134S186000, C134S902000, C015S021100, C015S088200, C015S088300

Reexamination Certificate

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06851436

ABSTRACT:
A system and method for re-circulating processing fluids in a substrate processing system is provided. A fluid re-circulation system for a brush box processing tool includes a supply tank into which processing chemicals, DI water, or other processing fluids are introduced into the system from an external source. Processing chemicals are provided to the brush box and dispensed to process a substrate. Dispensed fluids drain from the brush box into a diverter through which fluids either flow to waste, or into a collection tank. Fluids from the collection tank flow into the supply tank to re-circulate for wafer processing. The re-circulation system includes filters for maintaining chemical purity, and chemical concentration is monitored and adjusted as necessary.

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patent: 10-321577 (1998-12-01), None

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