Substrate processing method and a computer readable storage...

Details Substrate processing method and a computer readable storage... Substrate processing method and a computer readable storage...

2006-10-31

2006-10-31

Smith, Matthew (Department: 2823)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Combined with the removal of material by nonchemical means

C438S906000, C438S508000, C257SE21471, C257SE21313, C257SE21079

Reexamination Certificate

active

07129185

ABSTRACT:
A substrate processing method includes the steps of removing carbon from a surface of a silicon substrate by irradiating an ultraviolet light on the surface in an essentially ultraviolet nonreactive gas atmosphere and forming an oxide film or an oxynitride film on the surface of the silicon substrate by irradiating an ultraviolet light thereon in an essentially ultraviolet reactive gas atmosphere. Further, a computer readable storage medium stores therein a program for controlling the substrate processing method.

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