Substrate processing method

Details Substrate processing method Substrate processing method

2007-06-19

2007-06-19

Lindsay, Jr., Walter (Department: 2812)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

By reaction with substrate

C438S769000, C438S772000, C438S775000, C438S765000, C438S771000, C438S787000, C257SE21193, C257SE21209, C257SE21215, C257SE21218

Reexamination Certificate

active

10988561

ABSTRACT:
A substrate processing method comprises the step of forming an oxide film on a silicon substrate surface, and introducing nitrogen atoms into the oxide film by exposing the oxide film to nitrogen radicals excited in plasma formed by a microwave introduced via a planar antenna.

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