Semiconductor device manufacturing: process – Radiation or energy treatment modifying properties of... – By differential heating
Reexamination Certificate
2011-01-04
2011-01-04
Everhart, Caridad M (Department: 2895)
Semiconductor device manufacturing: process
Radiation or energy treatment modifying properties of...
By differential heating
C118S641000, C257SE21497, C257SE21002
Reexamination Certificate
active
07863204
ABSTRACT:
A substrate treating device comprising a treatment chamber for storing and treating substrates and a heating device having a heating element and a heat insulator and heating the substrates in the treatment chamber by the heating element. The heating element is so formed that only its one end is held by a holding part, and a projection projected to the treatment chamber side at the intermediate part of the heating element and positioned in proximity to or in contact with the heating element is formed on the heat insulator. A pin with an enlarged part is passed through the heating element and the heat insulator at the intermediate part of the heating element and the enlarged part is positioned in proximity to or in contact with the heating element. The plurality of projections may be formed on the heat insulator and the pins may be disposed between these plurality of projections.
REFERENCES:
patent: 5506389 (1996-04-01), Hidano et al.
patent: 6005225 (1999-12-01), Kowalski et al.
patent: 6228174 (2001-05-01), Takahashi
patent: 11-067424 (1999-03-01), None
patent: 2005-150101 (2005-06-01), None
International Search Report mailed on Nov. 28, 2006.
Hayashida Akira
Kitamura Kimio
Miyata Toshimitsu
Shimada Masakazu
Tanaka Kenji
Everhart Caridad M
Hitachi Kokusai Electric Inc.
Rader & Fishman & Grauer, PLLC
Teitokusha Co., Ltd.
LandOfFree
Substrate processing apparatus, heating apparatus for use in... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Substrate processing apparatus, heating apparatus for use in..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate processing apparatus, heating apparatus for use in... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2675375