Substrate processing apparatus and reaction container

Details Substrate processing apparatus and reaction container Substrate processing apparatus and reaction container

2011-03-08

2011-03-08

Zervigon, Rudy (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345430, C156S345440

Reexamination Certificate

active

07900580

ABSTRACT:
A substrate processing apparatus comprises a reaction chamber which is to accommodate stacked substrates, a gas introducing portion, and a buffer chamber, wherein the gas introducing portion is provided along a stacking direction of the substrates, and introduces substrate processing gas into the buffer chamber, the buffer chamber includes a plurality of gas-supply openings provided along the stacking direction of the substrates, and the processing gas introduced from the gas introducing portion is supplied from the gas-supply openings to the reaction chamber.

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