Substrate processing apparatus and focus ring

Details Substrate processing apparatus and focus ring Substrate processing apparatus and focus ring

2008-01-18

2011-10-25

Gramaglia, Maureen (Department: 1716)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With workpiece support

C118S728000

Reexamination Certificate

active

08043472

ABSTRACT:
A substrate processing apparatus that can reliably improve the efficiency of heat transfer between a focus ring and a mounting stage. A housing chamber with the interior thereof evacuated houses a substrate. The substrate is mounted on a mounting stage that is disposed in the housing chamber. An annular focus ring is mounted on the mounting stage such as to surround a peripheral portion of the mounted substrate. A heat transfer film is formed on a surface of the focus ring which contacts the mounting stage by printing processing.

REFERENCES:
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patent: 6514347 (2003-02-01), Denpoh
patent: 6723202 (2004-04-01), Nagaiwa et al.
patent: 6828243 (2004-12-01), Denpoh
patent: 2003/0215578 (2003-11-01), Okumura et al.
patent: 2005/0061447 (2005-03-01), Kim et al.
patent: 2001-308079 (2001-11-01), None
patent: 2002-16126 (2002-01-01), None

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