Substrate polishing metrology using interference signals

Details Substrate polishing metrology using interference signals Substrate polishing metrology using interference signals

2007-08-14

2010-06-08

Wilson, Lee D (Department: 3727)

Abrading

Precision device or process - or with condition responsive...

By optical sensor

C451S005000, C451S028000, C451S041000, C451S285000

Reexamination Certificate

active

07731566

ABSTRACT:
A method of polishing a substrate includes holding the substrate on a polishing pad with a polishing head, wherein the polishing pad is supported by a platen, creating relative motion between the substrate and the polishing pad to polish a side of the substrate, generating a light beam and directing the light beam towards the substrate to cause the light beam to impinge on the side of the substrate being polished. Light reflected from the substrate is at a detector to generate an interference signal. A measure of uniformity is computed from the interference signal.

REFERENCES:
patent: 4037367 (1977-07-01), Kruse
patent: 4272924 (1981-06-01), Masuko et al.
patent: 4328068 (1982-05-01), Curtis
patent: 4512847 (1985-04-01), Brunsch et al.
patent: 4793895 (1988-12-01), Kaanta et al.
patent: 4927485 (1990-05-01), Cheng et al.
patent: 4948259 (1990-08-01), Enke et al.
patent: 4954142 (1990-09-01), Carr et al.
patent: 5020283 (1991-06-01), Tuttle
patent: 5081421 (1992-01-01), Miller et al.
patent: 5081796 (1992-01-01), Schultz
patent: 5084071 (1992-01-01), Nenadic et al.
patent: 5132617 (1992-07-01), Leach et al.
patent: 5177908 (1993-01-01), Tuttle
patent: 5196353 (1993-03-01), Sandhu et al.
patent: 5213655 (1993-05-01), Leach et al.
patent: 5234868 (1993-08-01), Cote
patent: 5242524 (1993-09-01), Leach et al.
patent: RE34425 (1993-11-01), Schultz
patent: 5257478 (1993-11-01), Hyde et al.
patent: 5265378 (1993-11-01), Rostoker
patent: 5297364 (1994-03-01), Tuttle
patent: 5329734 (1994-07-01), Yu
patent: 5337015 (1994-08-01), Lustig et al.
patent: 5394655 (1995-03-01), Allen et al.
patent: 5395801 (1995-03-01), Doan et al.
patent: 5413941 (1995-05-01), Koos et al.
patent: 5433651 (1995-07-01), Lustig et al.
patent: 5486129 (1996-01-01), Sandhu et al.
patent: 5489233 (1996-02-01), Cook et al.
patent: 5514245 (1996-05-01), Doan et al.
patent: 5567503 (1996-10-01), Sexton et al.
patent: 5605760 (1997-02-01), Roberts
patent: 5609511 (1997-03-01), Moriyama et al.
patent: 5643048 (1997-07-01), Iyer
patent: 5663797 (1997-09-01), Sandhu
patent: 5672091 (1997-09-01), Takahashi et al.
patent: 5791969 (1998-08-01), Lund
patent: 5838447 (1998-11-01), Hiyama et al.
patent: 5893796 (1999-04-01), Birang et al.
patent: 5910043 (1999-06-01), Manzonie et al.
patent: 5949927 (1999-09-01), Tang
patent: 5964643 (1999-10-01), Birang et al.
patent: 6045439 (2000-04-01), Birang et al.
patent: 6068539 (2000-05-01), Bajaj et al.
patent: 6146248 (2000-11-01), Jairath et al.
patent: 6159073 (2000-12-01), Wiswesser et al.
patent: 6171181 (2001-01-01), Roberts et al.
patent: 6179709 (2001-01-01), Redeker et al.
patent: 6190234 (2001-02-01), Swedek et al.
patent: 6224460 (2001-05-01), Dunton et al.
patent: 6247998 (2001-06-01), Wiswesser et al.
patent: 6248130 (2001-06-01), Perry
patent: 6280289 (2001-08-01), Wiswesser et al.
patent: 6280290 (2001-08-01), Birang et al.
patent: 6336841 (2002-01-01), Chang
patent: 6383058 (2002-05-01), Birang et al.
patent: 6524164 (2003-02-01), Tolles
patent: 6537133 (2003-03-01), Birang et al.
patent: 6676717 (2004-01-01), Birang et al.
patent: 6719818 (2004-04-01), Birang et al.
patent: 6860791 (2005-03-01), Birang et al.
patent: 6875078 (2005-04-01), Birang et al.
patent: 6876454 (2005-04-01), Birang et al.
patent: 6910944 (2005-06-01), Birang et al.
patent: 7011565 (2006-03-01), Birang et al.
patent: 7118450 (2006-10-01), Birang et al.
patent: 7255629 (2007-08-01), Birang et al.
patent: 2005/0191945 (2005-09-01), Petroski et al.
patent: 2006/0014476 (2006-01-01), Birang et al.
patent: 2006/0040588 (2006-02-01), Elledge
patent: 2006/0063471 (2006-03-01), Muldowney
patent: 2006/0128271 (2006-06-01), Shiho et al.
patent: 2006/0217038 (2006-09-01), Wolf
patent: 2007/0021037 (2007-01-01), Birang et al.
patent: 2008/0227367 (2008-09-01), Birang et al.
patent: 0 663 265 (1995-07-01), None
patent: 0 738 561 (1996-10-01), None
patent: 0 846 040 (1997-02-01), None
patent: 0 881 040 (1998-12-01), None
patent: 0 881 484 (1998-12-01), None
patent: 1075634 (1954-10-01), None
patent: 57-138575 (1982-08-01), None
patent: 58-004353 (1983-01-01), None
patent: 58-178526 (1983-10-01), None
patent: 62-190726 (1987-08-01), None
patent: 62-190728 (1987-08-01), None
patent: 62211927 (1987-09-01), None
patent: 2222533 (1990-09-01), None
patent: 3-234467 (1991-10-01), None
patent: 5138531 (1993-06-01), None
patent: 5-309558 (1993-11-01), None
patent: 60-37076 (1994-02-01), None
patent: 7-052032 (1995-02-01), None
patent: 9-36072 (1997-01-01), None
patent: WO93/20976 (1993-10-01), None
patent: WO 94/07110 (1994-03-01), None
Anonymous, Endpoint Detection of Oxide Polishing and Planarization of Semiconductor Devices, Research Disclosure No. 340, Kenneth Mason Publication, Ltd., Aug. 1992.
Rodel, “Glass Polishing Pad”, Jan. 1993.

Affiliated with

Also associated with

Rating

Substrate polishing metrology using interference signals does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate polishing metrology using interference signals, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate polishing metrology using interference signals will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4207344