Substrate loading means for a chemical vapor deposition apparatu

Details Substrate loading means for a chemical vapor deposition apparatu Substrate loading means for a chemical vapor deposition apparatu

1983-09-06

1985-06-25

Smith, John D.

Coating apparatus

Gas or vapor deposition

Multizone chamber

118725, 118729, 414217, 414589, 414751, 414744R, C23C 1308

Patent

active

045247196

ABSTRACT:
A controlled temperature deposition device comprising an inner reaction chamber having gas distribution means for introducing gas into inner chamber and removing gas therefrom and a vacuum chamber means surrounding the inner deposition chamber and spaced from the walls thereof for maintaining a medium vacuum therein. Associated with the deposition device is a substrate loading and unloading fork which transfers substrates such as wafer boats from outside the device to a position in the inner deposition chamber and removes them from the inner deposition chamber following deposition.

REFERENCES:
patent: 3293074 (1966-12-01), Nickl
patent: 3704987 (1972-12-01), Arndt et al.
patent: 3749383 (1973-07-01), Voigt et al.
patent: 3951271 (1976-04-01), Mette

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