Substrate holder which is self-adjusting for substrate...

Details Substrate holder which is self-adjusting for substrate... Substrate holder which is self-adjusting for substrate...

2008-05-13

2008-05-13

Wells, Nikita (Department: 2881)

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

C250S492200

Reexamination Certificate

active

07372690

ABSTRACT:
A wafer chuck is designed to allow the substrate to thermally deform during charged particle beam lithography. The wafer chuck includes a compliant layer disposed over an chuck body. During lithography processing the wafer is electrostatically held in contact with a flexible compliant layer and the wafer is exposed to the charged particle beam resulting in thermal deformation of the wafer. The compliant layer deforms with the substrate and allows the wafer to deform in a predictable manner.

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