Substrate heating equipment for use in a semiconductor fabricati

Details Substrate heating equipment for use in a semiconductor fabricati Substrate heating equipment for use in a semiconductor fabricati

1996-08-09

1998-12-15

Walberg, Teresa J.

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

219405, 219411, 392418, 118728, 118 501, C23C 1600, H01L 21324, F27B 514

Patent

active

058500715

ABSTRACT:
A substrate heating equipment for use in a semiconductor fabricating apparatus includes a heater support frame disposed within a vacuum vessel, opposed panel heaters disposed in a pluri-shelved fashion within the heater support frame, and support means for supporting a substrate to be treated between an adjacent pair of the opposed panel heaters, whereby simultaneous heating of plural substrates to be treated is enabled. By controlling the individual temperature of the panel heaters, it also becomes possible to significantly reduce a tact time and to effect uniform heating of the substrates while the equipment is rendered compact.

REFERENCES:
patent: 4016006 (1977-04-01), Yoshinaka et al.
patent: 4951601 (1990-08-01), Mayden et al.
patent: 4979464 (1990-12-01), Kunze-Concewitz et al.
patent: 5162047 (1992-11-01), Wada et al.
patent: 5512320 (1996-04-01), Turner et al.
patent: 5607009 (1997-03-01), Turner et al.
patent: 5674786 (1997-10-01), Turner et al.

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