4. Coating apparatus
  5. Gas or vapor deposition
  6. Multizone chamber

Issei Makiguchi

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Substrate heating equipment for use in a semiconductor fabricati

Electric heating – Heating devices – Combined with container – enclosure – or support for material...
Patent

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Substrate processing apparatus

Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent

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Profile ID: LFUS-PAI-P-1154787

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