Substrate cover, and charged particle beam writing apparatus...

Details Substrate cover, and charged particle beam writing apparatus... Substrate cover, and charged particle beam writing apparatus...

2007-08-14

2009-10-27

Wells, Nikita (Department: 2881)

Semiconductor device manufacturing: process

Formation of semiconductive active region on any substrate

Amorphous semiconductor

C250S492220

Reexamination Certificate

active

07608528

ABSTRACT:
A substrate cover includes a frame-like member configured to be placed on a substrate which is to be written using a charged particle beam, and to have an outer perimeter dimension larger than a perimeter end of the substrate and an inner perimeter dimension, being a border between the frame-like member and an inner opening portion, smaller than the perimeter end of the substrate, and a contact point part configured to be provided on an undersurface of the frame-like member, in order to be electrically connected to the substrate.

REFERENCES:
patent: 2008/0268583 (2008-10-01), Yamazaki et al.
patent: 2009/0115029 (2009-05-01), Koyama et al.
patent: 2009/0117716 (2009-05-01), Shimomura et al.
patent: 5-158218 (1993-06-01), None

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