Structure with self aligned resist layer on an insulating...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07993817

ABSTRACT:
A structure is provided with a self-aligned resist layer on an insulator surface and non-lithographic method of fabricating the same. The non-lithographic method includes applying a resist on a structure comprising at least one of interconnects formed in an insulator material. The method further comprises exposing the resist to energy and developing the resist to expose surfaces of the interconnects. The method further comprises depositing metal cap material on the exposed surfaces of the interconnects.

REFERENCES:
patent: 5945250 (1999-08-01), Aoai et al.
patent: 6642147 (2003-11-01), Dokumaci et al.
patent: 2004/0150096 (2004-08-01), Purushothaman et al.
patent: 2005/0208430 (2005-09-01), Colburn et al.
patent: 2008/0220615 (2008-09-01), Brunner et al.
patent: 02-264259 (1990-10-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Structure with self aligned resist layer on an insulating... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Structure with self aligned resist layer on an insulating..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Structure with self aligned resist layer on an insulating... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2643606

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.