Structure having flush circuit features and method of making

Details Structure having flush circuit features and method of making Structure having flush circuit features and method of making

2006-08-29

2006-08-29

Ahmed, Shamim (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Combined with coating step

C438S745000, C438S754000

Reexamination Certificate

active

07098136

ABSTRACT:
Embedded flush circuitry features are provided by providing a carrier foil having an electrically conductive layer therein and coating the electrically conductive layer with a dielectric material. Circuitry features are formed in the dielectric material and conductive metal is plated to fill the circuitry features.

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