Structure for preventing gap formation and plasma processing...

Details Structure for preventing gap formation and plasma processing... Structure for preventing gap formation and plasma processing...

2008-01-09

2010-06-01

Hassanzadeh, Parviz (Department: 1792)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

Having glow discharge electrode gas energizing means

C118S7230ER

Reexamination Certificate

active

07727354

ABSTRACT:
Plasma processing equipment having a structure for preventing gap formation includes: a chamber inside which a plasma environment is formed; an upper electrode positioned at a upper position of the chamber; an electrostatic chuck positioned at a lower position of the electrostatic chuck, having a lower electrode and holding a wafer on a top surface thereof; a ring positioned at an outer side of the electrostatic chuck; and a gap prevention unit for isolating from the outside a space between the electrostatic chuck and the ring.

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Decision of Grant dated Jun. 23, 2008 in corresponding Korean Patent Application No. 10-2007-0002959.

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