Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2006-07-04
2006-07-04
Barreca, Nicole (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S014000, C430S311000, C430S317000, C430S950000
Reexamination Certificate
active
07070911
ABSTRACT:
A structure and method for reducing standing waves in a photoresist during manufacturing of a semiconductor is presented. Embodiments of the present invention include a method for reducing standing wave formation in a photoresist during manufacturing a semiconductor device comprising depositing a first anti-reflective coating having an extinction coefficient above a material, and depositing a second anti-reflective coating having an extinction coefficient above the first anti-reflective coating, such that the first anti-reflective coating and the second anti-reflective coating reduce the formation of standing waves in a photoresist during a lithography process.
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patent: 6562544 (2003-05-01), Cheung et al.
patent: 6599838 (2003-07-01), Shih et al.
patent: 6853043 (2005-02-01), Yeh et al.
Ghandehari Kouros
Hopper Dawn
Ngo Minh Van
Advanced Micro Devices , Inc.
Barreca Nicole
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