Structure and method for forming a dielectric chamber and...

Details Structure and method for forming a dielectric chamber and... Structure and method for forming a dielectric chamber and...

2007-12-11

2007-12-11

Zarneke, David A (Department: 2891)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C257SE21573

Reexamination Certificate

active

11129325

ABSTRACT:
A method (and structure) that selectively forms a dielectric chamber on an electronic device by forming a dummy structure over a semiconductor substrate, depositing a dielectric layer over the dummy structure, forming an opening through the dielectric layer to the dummy structure, and removing the dummy structure to form the dielectric chamber.

REFERENCES:
patent: 5444015 (1995-08-01), Aitken et al.
patent: 6013536 (2000-01-01), Nowak et al.
patent: 6057224 (2000-05-01), Bothra et al.
patent: 6509623 (2003-01-01), Zhao

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