Strained finFET CMOS device structures

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S347000, C257S350000, C257S401000

Reexamination Certificate

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07388259

ABSTRACT:
A semiconductor device structure, includes a PMOS device200and an NMOS device300disposed on a substrate1,2, the PMOS device including a compressive layer6stressing an active region of the PMOS device, the NMOS device including a tensile layer9stressing an active region of the NMOS device, wherein the compressive layer includes a first dielectric material, the tensile layer includes a second dielectric material, and the PMOS and NMOS devices are FinFET devices200, 300.

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