Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
Reexamination Certificate
2011-01-18
2011-01-18
Pham, Thanh V (Department: 2894)
Semiconductor device manufacturing: process
Formation of semiconductive active region on any substrate
C438S095000, C438S237000, C257SE21158
Reexamination Certificate
active
07871906
ABSTRACT:
In various embodiments, the present disclosure may provide a storage node. In various implementations, the storage node may include a bottom electrode having a non-planar bottom surface that conforms with and is connected to a non-planar top surface of a diode electrode of a memory device. The storage node may further include a phase change layer on top of a bottom diode and a top electrode on a top surface of a phase change layer.
REFERENCES:
patent: 6121134 (2000-09-01), Burton et al.
patent: 2003/0116794 (2003-06-01), Lowrey
patent: 2004/0084772 (2004-05-01), Iyer et al.
patent: 2004/0113232 (2004-06-01), Johnson et al.
patent: 2005/0029587 (2005-02-01), Harshfield
patent: 2005/0101084 (2005-05-01), Gilton
patent: 2005/0227496 (2005-10-01), Park et al.
patent: 2006/0237756 (2006-10-01), Park et al.
patent: 2007/0080421 (2007-04-01), Lee et al.
Baik Hion-Suck
Kang Sung-kwan
Lee Jong-wook
Lee Jun-Ho
Harness & Dickey & Pierce P.L.C.
Nguyen Duy T
Pham Thanh V
Samsung Electronics Co,. Ltd.
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