Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1996-12-03
1999-02-02
Mottola, Steven
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
333 173, 31511151, H05H 124
Patent
active
058669850
ABSTRACT:
Apparatus and method for obtaining stable matching networks for plasma tools for use in the plasma processing industry. In an RF plasma apparatus, running at a matched condition for a transmission line and the plasma tool matching network such that the input impedance at the input to the transmission line is different than that of the output impedance of an RF generator and such that when the plasma density in the plasma tool decreases the input impedance will match the output impedance of the generator.
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Coultas Dennis Keith
Keller John Howard
Bettendorf Justin P.
International Business Machines - Corporation
Mortinger Alison D.
Mottola Steven
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