Stabilizing plasma and generator interactions

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating

Reexamination Certificate

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C315S111810

Reexamination Certificate

active

10741226

ABSTRACT:
An approach for stabilizing the interactions between a plasma and the generator powering the plasma is provided. Reactive elements disposed between the power generator and plasma operate to modify the apparent impedance characteristics of the plasma such that the trajectory of the plasma load impedance as a function of power is substantially aligned locally with the contours of constant power output in impedance space. In this way, instabilities in the generator and plasma system are avoided because reinforcement or amplification of fluctuations in plasma impedance due to interactions between the generator and the plasma are reduced or eliminated. The reactive elements may be variable in order to align plasma trajectories and generator power contours under a range of process conditions.

REFERENCES:
patent: 5195045 (1993-03-01), Keane et al.
patent: 5441596 (1995-08-01), Nulty
patent: 5643364 (1997-07-01), Zhao et al.
patent: 5747935 (1998-05-01), Porter et al.
patent: 5815047 (1998-09-01), Sorensen et al.
patent: 5842154 (1998-11-01), Harnett
patent: 5929717 (1999-07-01), Richardson et al.
patent: 6046546 (2000-04-01), Porter et al.
patent: 6305316 (2001-10-01), DiVergilio et al.
patent: 6313584 (2001-11-01), Johnson et al.
patent: 6399507 (2002-06-01), Nallan et al.
patent: 6631693 (2003-10-01), Hilliker
patent: 6777881 (2004-08-01), Yuzurihara et al.
patent: 6838832 (2005-01-01), Howald et al.
patent: 2002/0179247 (2002-12-01), Davis et al.
Lieberman, M.A., et al., Instabilities in Low Pressure Inductive Discharges with Attaching Gases, 1999 American Institute of Physics, pp. 3617-n3619.
Descoeudres, A., et al., Attachment-induced Ionization Instability in Electronegative Capacitive RF Discharges, Plasma Sources Sci. Technol. 12 (2003, pp. 152-157.
Goodman, D.L., Active Control of Instabilities for Plasma Processing with Electronegative Gases; J. Phys. D: Appl. Phys. 36 (2003); pp. 2845-2852.

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