Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2008-05-06
2008-05-06
Harvey, Minsun Oh (Department: 2828)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S067000, C257S350000, C257S798000, C257S331000, C257S328000, C257SE21661, C257S393000, C257S401000
Reexamination Certificate
active
07368788
ABSTRACT:
Complementary metal oxide semiconductor (CMOS) static random access memory (SRAM) cells include at least a first inverter formed in a fin-shaped pattern of stacked semiconductor regions of opposite conductivity type. In some of these embodiments, the first inverter includes a first conductivity type (e.g., P-type or N-type) MOS load transistor electrically coupled in series with a second conductivity type (e.g., N-type of P-type) MOS driver transistor. The first inverter is arranged so that active regions of the first conductivity type MOS load transistor and the second conductivity type driver transistor are vertically stacked relative to each other within a first portion of a vertical dual-conductivity semiconductor fin structure. This fin structure is surrounded on at least three sides by a wraparound gate electrode, which is configured to modulate conductivity of both the active regions in response to a gate signal.
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Baik Seung-Jae
Huo Zong-Liang
Kim Shi-Eun
Yeo In-Seok
Yoon Hong-Sik
Harvey Minsun Oh
King Joshua J
Myers Bigel & Sibley Sajovec, PA
Samsung Electronics Co,. Ltd.
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