Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1998-02-11
2000-11-14
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C23C 1434
Patent
active
061465054
ABSTRACT:
The present invention provides a method for producing layered aluminum fine particles, and applications to single electron tunneling quantum devices, and the present invention further relates to a method for producing spherical metallic aluminum fine particles (layered aluminum fine particles), characterized in that metallic aluminum is supplied into a mixed gas of helium and 1.times.10.sup.-7 to 3.times.10.sup.-7 torr water vapor by sputtering induced by argon gas discharge to generate aggregates, after which this product is released into a vacuum to generate single crystals in which the surface layer is covered with alumina.
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Goto Masahiro
Igarashi Kazuo
Murakami Jun-ichi
Tai Yutaka
Tanemura Sakae
Agency of Industrial Science and Technology
Cantelmo Gregg
Nguyen Nam
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