Sputter-etching device

Details Sputter-etching device Sputter-etching device

1981-04-21

1982-09-28

O'Keefe, Veronica

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192C, 204192E, C23C 1500

Patent

active

043517145

ABSTRACT:
A sputter-etching device has a hollow electrode with an internal space in which gas plasma is formed and an opening which is confronted with the inner wall of a vacuum chamber to provide an electric discharge gap therebetween. An object to be processed is placed on the side of the vacuum chamber instead of the side of the electrode. The sputter-etching device is combined with a sputtering device so that immediately after being cleaned by sputter-etching, the object is subjected to sputtering.

REFERENCES:
patent: 3180751 (1965-04-01), Law
patent: 3502562 (1970-03-01), Humphries
patent: 4062319 (1977-12-01), Roth et al.
patent: 4126530 (1978-11-01), Thornton
patent: 4204942 (1980-05-01), Chabroudi
patent: 4265730 (1981-05-01), Hirose et al.
patent: 4268374 (1981-05-01), Lepselter
patent: 4274936 (1981-06-01), Love
Robert W. Berry et al., Thin Film Technology, Van Nostrand Reinhold Co., New York, 1968 pp. 200-201.

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