Split-phase driver for plasma etch system

Details Split-phase driver for plasma etch system Split-phase driver for plasma etch system

1988-09-15

1989-10-03

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156345, 20419232, 204298, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

048714216

ABSTRACT:
A plasma etching system includes a radio frequency generator and a parallel plate plasma reactor vessel. A phase inverter circuit is used to couple the RF generator to the electrodes in the plasma reactor so that the electrodes are driven with voltages of substantially equal magnitude but which are 180.degree. out-of-phase. In this way, a maximum potential difference between the electrodes can be achieved while minimizing the potential difference between the individual electrodes and the reactor vessel. Such operation allows higher power levels with reduced occurrence of arcing and stray discharge, and provides a stable, uniform plasma discharge.

REFERENCES:
patent: 4134817 (1978-01-01), Bourdon
patent: 4253907 (1981-03-01), Parry et al.
patent: 4399016 (1983-08-01), Tsukada et al.
patent: 4626312 (1986-12-01), Tracy
patent: 4711767 (1987-12-01), Diederich
patent: 4724296 (1988-02-01), Morley

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