Coating apparatus – With means to centrifuge work
Patent
1998-06-22
2000-12-19
Edwards, Laura
Coating apparatus
With means to centrifuge work
118319, 118320, 118600, 118610, B05C 1108
Patent
active
06162294&
ABSTRACT:
An apparatus for exhausting coating materials used in the process of spin coating a top surface of a wafer, the wafer having an edge and a bottom surface that is supported and rotated by a rotatable chuck attached by a shaft to a spin motor. The apparatus includes a bowl having an exhausted drain configured to receive excess liquid and vapor from the spin coating and an assembly configured to maintain the drain at a negative pressure differential relative to the bowl. In a preferred embodiment, a baffle is attached to the bottom to limit the flow of the liquid and vapor into the drain to a predetermined direction.
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Davis Shawn D.
Davlin John T.
Hayes Bruce L.
Molebash John S.
Edwards Laura
Micro)n Technology, Inc.
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