Optics: measuring and testing – By polarized light examination – Of surface reflection
Reexamination Certificate
2007-01-02
2007-01-02
Pham, Hoa Q. (Department: 2877)
Optics: measuring and testing
By polarized light examination
Of surface reflection
Reexamination Certificate
active
10699540
ABSTRACT:
A spectroscopic ellipsometer or polarimeter system having a source of a polychromatic beam of electromagnetic radiation, a polarizer, a stage for supporting a material system, an analyzer, a dispersive optics and a detector system which comprises a multiplicity of detector elements, there being apertures before the stage for supporting a material system, and thereafter, the system being present in an environmental control chamber.
REFERENCES:
patent: 584495 (1897-06-01), Abbe
patent: 2447828 (1948-08-01), West
patent: 3817624 (1974-06-01), Martin
patent: 4053232 (1977-10-01), Dill et al.
patent: 4054812 (1977-10-01), Lessner et al.
patent: 4176951 (1979-12-01), Robert et al.
patent: 4179217 (1979-12-01), Robert et al.
patent: 4322165 (1982-03-01), Ellebracht et al.
patent: 4556292 (1985-12-01), Mathyssek et al.
patent: 4668086 (1987-05-01), Redner
patent: 4764013 (1988-08-01), Johnston
patent: 4770895 (1988-09-01), Hartley
patent: 4772104 (1988-09-01), Buhrer
patent: 4875773 (1989-10-01), Burns et al.
patent: 4917461 (1990-04-01), Goldstein
patent: 4961634 (1990-10-01), Chipman et al.
patent: 5091320 (1992-02-01), Aspnes et al.
patent: 5166752 (1992-11-01), Spanier et al.
patent: 5229833 (1993-07-01), Stewart
patent: 5329357 (1994-07-01), Bernoux et al.
patent: 5337146 (1994-08-01), Azzam
patent: 5373359 (1994-12-01), Woollam et al.
patent: 5475525 (1995-12-01), Tournois et al.
patent: 5504582 (1996-04-01), Johs et al.
patent: 5521706 (1996-05-01), Green et al.
patent: 5581350 (1996-12-01), Chen et al.
patent: 5596406 (1997-01-01), Rosencwaig et al.
patent: 5666201 (1997-09-01), Johs et al.
patent: 5706212 (1998-01-01), Thompson et al.
patent: 5793480 (1998-08-01), Lacey et al.
patent: 5818596 (1998-10-01), Imai et al.
patent: 5859424 (1999-01-01), Norton et al.
patent: 5872630 (1999-02-01), Johs et al.
patent: 5877859 (1999-03-01), Aspnes et al.
patent: 5929995 (1999-07-01), Johs
patent: 5946098 (1999-08-01), Johs et al.
patent: 5963325 (1999-10-01), Johs et al.
patent: 5973787 (1999-10-01), Aspnes et al.
patent: 6031619 (2000-02-01), Wilkens et al.
patent: 6034777 (2000-03-01), Johs et al.
patent: 6084674 (2000-07-01), Johs et al.
patent: 6084675 (2000-07-01), Herzinger et al.
patent: 6100981 (2000-08-01), Johs et al.
patent: 6118537 (2000-09-01), Johs et al.
patent: 6134012 (2000-10-01), Aspnes et al.
patent: 6141102 (2000-10-01), Johs et al.
patent: 6181421 (2001-01-01), Aspnes et al.
patent: 6320657 (2001-11-01), Aspnes et al.
patent: 6414302 (2002-07-01), Freeouf
patent: 6493097 (2002-12-01), Ivarsson
patent: 6624890 (2003-09-01), Backman et al.
patent: 2002/0149774 (2002-10-01), McAninch
patent: 2003/0071996 (2003-04-01), Wang et al.
patent: 2003/0150997 (2003-08-01), Eckert et al.
patent: WO 01/90687 (2001-11-01), None
UUV-VASE, JA Woollam Marketing Flyer.
“A New Purged UV Spectroscopic Ellipsometer to Characterize Thin Films and Multilayers at 157nm”, Boher et al., Proc. SPIE, vol. 3998, (Jun. 2000).
“Characterisation of Thin Films and Multilayers in the VUV Wavelength Range Using Spectroscopic Ellipsometry and Spectroscopic Photometry”, Boher et al., 157nm Symposium, May 2000).
“Progress in Spectroscopic Ellipsometry: Applications from Ultraviolet to Infrared”, Hilfiker et al., J. Vac. Sci. Technol. A, (Jul./Aug. 2003).
“Atomic Scale Characterization of Semiconductors by In-Stiu Real Time Spectroscopic Ellipsometry”, Boher et al., Thin Solid Films 318 (1998).
“Optical Characterization in the Vacuum Ultraviolet with Variable Angle Spectroscopic Ellipsometry: 157nm and below”, Hilfiker et al., Proc. SPIE vol. 3998 (2000).
“Feasibility and Applicability of Integrated Metrology Using Spectroscopic Ellipsometry in a Cluster Tool”, Boher et al., SPIE vol. 4449, (2001).
“Characterization of Wide Bandgap Thin Film Growth Using UV-Extended Real Time Spectroscopic Ellipsometry Applications to Cubic Boron Nitride”, Zapien et al., J. of Wide Bandgap Materials, vol. 9, No. 3 (Jan. 2002).
“Automated Rotating Element Ellipsometers: Calibration, Operation, and Real-Time Applications”, Collins, Rev. Sci. Instrum. 61 (8) (Aug. 1990).
“Waveform Analysis With Optical Multichannel Detectors: Applications for Rapid-Scan Spectroscopic Ellipsometers”, An et al., Rev. Sci. Instrum. 62(8), (Aug. 1991); and.
“Multichannel Ellipsometer for Real Time Spectroscopy of Thin Film Deposition for 1.5 to 6.5 eV”, Zapien et al., Rev. Sci. Instrum. vol. 71, No. 9, (Sep. 1991).
He Ping
Herzinger Craig M.
Johs Blaine D.
Liphardt Martin M.
Pfeiffer Galen L.
J.A. Woollam Co. Inc.
Pham Hoa Q.
Welch James D.
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