Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2006-01-17
2006-01-17
Whitehead, Jr., Carl (Department: 2813)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
C438S060000, C438S075000, C977S726000
Reexamination Certificate
active
06987071
ABSTRACT:
Spaces in a nanostructure can be filled with an organic material while in the solid state below Tm(without heating) by exposing the organic material to solvent vapor while on or mixed with the nanostructured material. The exposure to solvent vapor results in intimate contact between the organic material and the nanostructured material without having to expose them to possibly detrimental heat to melt in the organic material. Solution processing methods need only to be employed to create bulk films while organic material infiltration can take place in the solid state after depositing the film.
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Bollman Brent J.
Petritsch Klaus
Robinson Matthew R.
Doty Heather A.
Isenberg Joshua D.
JDI Patent
Jr. Carl Whitehead
Nanosolar, Inc.
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