Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2007-01-19
2010-11-02
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S326000, C430S330000, C430S271100, C430S272100, C430S313000, C430S323000, C528S259000, C525S154000, C522S111000, C522S164000, C522S166000
Reexamination Certificate
active
07824844
ABSTRACT:
The invention relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least one primary organic solvent and at least one secondary organic solvent selected from any of structures 1, 2 and 3,where, R1, R3, and R4, are selected from H and C1-C6alkyl, and R2, R5, R6, R7, R8, and R9are selected from C1-C6alkyl, and n=1-5. The invention also relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least 2 organic solvents, and where the antireflective coating composition has a liquid particle count at 0.2 micron of less than 100/ml after accelerated aging.
REFERENCES:
patent: 3474054 (1969-10-01), White
patent: 3775112 (1973-11-01), Alsup et al.
patent: 4064191 (1977-12-01), Parekh
patent: 4200729 (1980-04-01), Calbo
patent: 4251665 (1981-02-01), Calbo
patent: 4491628 (1985-01-01), Ito et al.
patent: 5187019 (1993-02-01), Calbo et al.
patent: 5350660 (1994-09-01), Urano et al.
patent: 5597868 (1997-01-01), Kunz
patent: 5843624 (1998-12-01), Houlihan et al.
patent: 5891959 (1999-04-01), Kunz
patent: 6048934 (2000-04-01), Wilt et al.
patent: 6447980 (2002-09-01), Rahman et al.
patent: 6723488 (2004-04-01), Kudo et al.
patent: 6790587 (2004-09-01), Feiring et al.
patent: 6818250 (2004-11-01), George et al.
patent: 6818258 (2004-11-01), Kaneko et al.
patent: 6849377 (2005-02-01), Feiring et al.
patent: 6866984 (2005-03-01), Jung et al.
patent: 7264913 (2007-09-01), Wu et al.
patent: 2003/0065164 (2003-04-01), Puligadda et al.
patent: 2003/0148213 (2003-08-01), Kaneko et al.
patent: 2004/0072420 (2004-04-01), Enomoto et al.
patent: 2004/0101779 (2004-05-01), Wu et al.
patent: 2005/0266335 (2005-12-01), Johnson et al.
patent: 2006/0058468 (2006-03-01), Wu et al.
patent: 2006/0228646 (2006-10-01), Zampini et al.
patent: 2008/0038659 (2008-02-01), Wu et al.
Notification of Transmittal of the International Search Report and the Written Opinion of the International Searching Authority, or the Declaration (Form PCT/ISA/220), International Search Report (Form PCT/ISA/210), and Written Opinion of the International Searching Authority (Form PCT/ISA/237) for PCT/IB2008/000118.
Kodama et al., “Synthesis or Novel Fluoropolymer for 157nm Photoresists by Cyclo-polymerization”, SPIE vol. 5690, pp. 76-pp. 83, 2002.
U.S. Appl. No. 11/502,706, filed Aug. 10, 2006, Wu et al.
Form PCT/IB/326, Form PCT/IB373, and Form PCT/ISA/237 for PCT/IB2008/000118 dated Jul. 30,2009, which corresponds to U.S. Appl. No. 11/624,744.
Gonzalez Eleazar
Neisser Mark O.
Wu Hengpeng
Xiang Zhong
Zhuang Hong
AZ Electronic Materials USA Corp.
Hamilton Cynthia
Jain Sangya
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