Solutions of permonosulphuric acid

Chemistry of inorganic compounds – Sulfur or compound thereof – Oxygen containing

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134 3, 134 41, 1566591, 156901, 156904, 252 792, 252 794, 25218627, 423273, C01B 1506, C23G 102, C09K 1304, C11D 718

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049633422

ABSTRACT:
Aqueous mixed permonosulphuric acid/sulphuric acid solutions, such as semiconductor surface photoresist stripping solutions may be stabilised for storage by the addition of one or more of the metals gallium, germanium, indium, tin in the 4-valent form, antimony, thallium, bismuth and lead suitably in the oxide or hydrous oxide form. Mixtures of metals, for example of bismuth, tin in the 4-valent form, gallium and germanium may be particularly effective.

REFERENCES:
patent: 3043658 (1962-07-01), Banfield
patent: 3053633 (1962-09-01), Dunlop et al.
patent: 3333925 (1967-08-01), Young
patent: 3383174 (1968-05-01), Carnine et al.
patent: 3387939 (1968-06-01), Reilly et al.
patent: 4051058 (1977-09-01), Bowing et al.
patent: 4362706 (1982-12-01), Willard
patent: 4395302 (1983-07-01), Courduvelis
patent: 4401509 (1983-08-01), Schellinger, Jr.
patent: 4534945 (1985-08-01), Hopkins
patent: 4885106 (1989-12-01), Lapham et al.
patent: 4917122 (1990-04-01), Lapham

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