Solid CO2 cleaning

Details Solid CO2 cleaning Solid CO2 cleaning

2005-04-05

2005-04-05

El-Arini, Zeinab (Department: 1746)

Cleaning and liquid contact with solids

Processes

Using solid work treating agents

C134S006000, C134S018000, C134S021000, C134S037000, C134S902000

Reexamination Certificate

active

06875286

ABSTRACT:
A method and apparatus are provided for removing solid and/or liquid residues from electronic components such as semiconductor wafers utilizing liquid or supercritical carbon dioxide which is solidified on the surface of the wafer and then vaporized and removed from the system. In a preferred embodiment the solidification and vaporizing steps are repeated (cycled) before removal of the CO2from the vessel. The residues are carried away with the vaporized carbon dioxide.

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