Single workpiece processing system

Details Single workpiece processing system Single workpiece processing system

2005-08-16

2005-08-16

Zarneke, David (Department: 2891)

Semiconductor device manufacturing: process

Chemical etching

Combined with coating step

C438S906000, C438S907000, C438S913000, C438S780000, C438S782000, C134S001300

Reexamination Certificate

active

06930046

ABSTRACT:
A system and method for processing a workpiece, includes workpiece processors. A robot is moveable within an enclosure to load and unload workpieces into and out of the processors. A processor includes an upper rotor having a central air flow opening. The upper rotor is magnetically driven into engagement with a lower rotor to form a workpiece processing chamber. A moveable drain mechanism aligns different drain paths with the processing chamber so that different processing fluids may be removed from the processing chamber via different drain paths. A moveable nozzle positioned in the air flow opening distributes processing fluid to the workpiece. The processing fluid is distributed across the workpiece surface, via centrifugal force generated by spinning the processing chamber, and removed from the processing chamber via the moveable drain mechanism.

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