Single wafer cleaning method to reduce particle defects on a...

Details Single wafer cleaning method to reduce particle defects on a... Single wafer cleaning method to reduce particle defects on a...

2007-01-16

2007-01-16

Deo, Duy-Vu N (Department: 1765)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C438S745000

Reexamination Certificate

active

10736007

ABSTRACT:
Methods of preventing air-liquid interfaces on the surface of a wafer in order to prevent the formation of particle defects on a wafer are presented. The air-liquid interfaces may be prevented by covering the entire surface of the wafer with liquid at all times during a cleaning process while the surface of the wafer is hydrophobic. Methods of preventing the formation of silica agglomerates in a liquid during a pH transition from an alkaline pH to a neutral pH are also presented, including minimizing the turbulence in the liquid solution and reducing the temperature of the liquid solution during the transition.

REFERENCES:
patent: 5466389 (1995-11-01), Ilardi et al.
patent: 5853491 (1998-12-01), Schulz
patent: 6468362 (2002-10-01), Chen et al.
patent: 2003/0051742 (2003-03-01), Boyers
patent: 2004/0029388 (2004-02-01), Verhaverbeke et al.
patent: 2004/0029395 (2004-02-01), Zhang et al.
patent: 2004/0221877 (2004-11-01), Bergman
Iler, Ralph K., The Colloid Chemistry Of Silica And Silicates, © 1955 By Cornell University, Cornell University Press, London: Geoffrey Cumberlege, Oxford University Press, First published 1955, Printed in the United States Of America By The George Banta Publishing Company, Menasha, Wisconsin, pp. 44-48.

Affiliated with

Also associated with

Rating

Single wafer cleaning method to reduce particle defects on a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Single wafer cleaning method to reduce particle defects on a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Single wafer cleaning method to reduce particle defects on a... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3766458