Silylation treatment unit and method

Details Silylation treatment unit and method Silylation treatment unit and method

2005-03-29

2005-03-29

Thompson, Craig A. (Department: 2813)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

By reaction with substrate

Reexamination Certificate

active

06872670

ABSTRACT:
A silylation treatment unit includes a chamber, a heating mechanism provided in this chamber for heating a substrate, a supplying mechanism for supplying a vapor including a silylation reagent into the chamber. The unit also has a substrate holder for holding the substrate in the chamber, in which an interval between the heating mechanism and the substrate is adjustable to at least three levels or more. The substrate is received such that it is least influenced by a heat in the chamber by maximizing the interval from the heating mechanism. The interval is brought comparatively closer to the heating mechanism to wait until the temperature inside the chamber obtains a high planer uniformity. The interval is brought further closer to the heating mechanism after a high planer uniformity is obtained such that a silylation reaction occurs.

REFERENCES:
patent: 4867838 (1989-09-01), Brooks et al.
patent: 5620523 (1997-04-01), Maeda et al.
patent: 5620525 (1997-04-01), Van de Ven et al.
patent: 5843233 (1998-12-01), Van de Ven et al.
patent: 5962085 (1999-10-01), Hayashi et al.
patent: RE36957 (2000-11-01), Brors et al.
patent: 6143078 (2000-11-01), Ishikawa et al.
patent: 6151446 (2000-11-01), Hunter et al.
patent: 6232236 (2001-05-01), Shan et al.
patent: 6291800 (2001-09-01), Shirakawa et al.
patent: 6354832 (2002-03-01), Yoshimura et al.
patent: 6402844 (2002-06-01), Harada et al.
patent: 6402849 (2002-06-01), Kwag et al.
patent: 6409838 (2002-06-01), Sakai
patent: 20020043526 (2002-04-01), Blanter
patent: 3-14223 (1991-01-01), None
patent: 4-287308 (1992-10-01), None
patent: 9-326341 (1997-12-01), None
patent: 11-274024 (1999-10-01), None

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