Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1997-05-21
1998-08-04
Jackson, Jerome
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257350, H01L 2701
Patent
active
057897816
ABSTRACT:
An improved Silicon-On-Insulator (SOI) semiconductor device having a first and second asymmetric transistor, each having a source, a body, a gate, and a drain. The respective gates and drains of the asymmetric transistors are connected together such that a transistor pair is formed which is operable as a single symmetric transistor. An NMOS transistor pair may be connected in parallel with a PMOS transistor pair so as to form a symmetric Pass Gate.
REFERENCES:
patent: 4231051 (1980-10-01), Custode et al.
patent: 4493056 (1985-01-01), Mao
patent: 4920509 (1990-04-01), Hmida et al.
patent: 4922246 (1990-05-01), Cormen et al.
patent: 5072286 (1991-12-01), Minami et al.
patent: 5151759 (1992-09-01), Vinal
patent: 5334861 (1994-08-01), Pfiester et al.
patent: 5461251 (1995-10-01), Yang et al.
Allied-Signal Inc.
Jackson Jerome
Kelley Nat
Kreger, Jr. Verne E.
Massung Howard G.
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