Silicon-on-insulator (SOI) semiconductor device and method of ma

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257350, H01L 2701

Patent

active

057897816

ABSTRACT:
An improved Silicon-On-Insulator (SOI) semiconductor device having a first and second asymmetric transistor, each having a source, a body, a gate, and a drain. The respective gates and drains of the asymmetric transistors are connected together such that a transistor pair is formed which is operable as a single symmetric transistor. An NMOS transistor pair may be connected in parallel with a PMOS transistor pair so as to form a symmetric Pass Gate.

REFERENCES:
patent: 4231051 (1980-10-01), Custode et al.
patent: 4493056 (1985-01-01), Mao
patent: 4920509 (1990-04-01), Hmida et al.
patent: 4922246 (1990-05-01), Cormen et al.
patent: 5072286 (1991-12-01), Minami et al.
patent: 5151759 (1992-09-01), Vinal
patent: 5334861 (1994-08-01), Pfiester et al.
patent: 5461251 (1995-10-01), Yang et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Silicon-on-insulator (SOI) semiconductor device and method of ma does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silicon-on-insulator (SOI) semiconductor device and method of ma, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon-on-insulator (SOI) semiconductor device and method of ma will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1179974

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.