Silicon containing TARC/barrier layer

Details Silicon containing TARC/barrier layer Silicon containing TARC/barrier layer

2008-01-22

2008-01-22

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S325000, C430S326000, C430S313000, C430S316000, C430S317000, C430S318000

Reexamination Certificate

active

07320855

ABSTRACT:
A top anti-reflective coating material (TARC) and barrier layer, and the use thereof in lithography processes, is disclosed. The TARC/barrier layer may be especially useful for immersion lithography using water as the imaging medium. The TARC/barrier layer comprises a polymer which comprises at least one silicon-containing moiety and at least one aqueous base soluble moiety. Suitable polymers include polymers having a silsesquioxane (ladder or network) structure, such as polymers containing monomers having the structure:where R1comprises an aqueous base soluble moiety, and x is from about 1 to about 1.95, more preferably from about 1 to about 1.75.

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U.S. Appl. No. 10/855,045, filed May 27, 2004, Entitled: Top Coat Material and Use Thereof in Lithography Processes.

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