Silicon-containing polymer and its use as a masking resin in a l

Details Silicon-containing polymer and its use as a masking resin in a l Silicon-containing polymer and its use as a masking resin in a l

1987-05-07

1988-09-13

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430326, 430313, 430270, 156643, G03C 516

Patent

active

047709774

ABSTRACT:
Photosensitive film which is photosensitive in a given wavelength range comprises at least one silicon-containing polymer, at least one salt which can be converted into a Brunsted acid by irradiation and optionally at least one photosensitizer. The silicon-containing polymer-based photosensitive film can be used as a masking resin in a lithography process for producing electronic components.

REFERENCES:
patent: 4442197 (1984-04-01), Crivello et al.
patent: 4551417 (1985-11-01), Suzuki et al.

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